Far-Field Nanostructuring in Dielectric Materials Beyond the Diffraction Limit Using Femtosecond Laser

Yang LIAO; Ya CHENG; Koji SUGIOKA

doi:10.2184/lsj.43.11_752

レーザー解説

Far-Field Nanostructuring in Dielectric Materials Beyond the Diffraction Limit Using Femtosecond Laser

Yang LIAO, Ya CHENG, Koji SUGIOKA

著者情報

キーワード: Femtosecond laser, Far field, Nanostructuring, Nanograting, Nanoripple

ジャーナルフリー

2015 年 43 巻 11 号 p. 752-

DOI https://doi.org/10.2184/lsj.43.11_752

詳細

抄録

We review the latest progress in the development of far-field nanostructuring technologies based on femtosecond laser direct writing. The principles for breaking through the diffraction limit in the interaction of a focused ultrafast laser beam with dielectric materials are presented, and applications of the femtosecond laser nanostructuring are discussed.

責任著者(Corresponding author)

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