抄録
In this paper the first demonstration of the photo-etching of polymethyl methacry late (PMMA) by using a high power excimer laser in the ultraviolet has been carried out.The irradiating la erenergies necessary for obtaining a certain etching depth decreased abruptly by increasing the irradiating power.These experimental results show the excimer lasers are the effectiYe light sources for the ultraviolet photo-etching and also far ultraviolet lithography.
