Journal of the Mass Spectrometry Society of Japan
Online ISSN : 1880-4225
Print ISSN : 1340-8097
ISSN-L : 1340-8097
総説
内殻励起イオン脱離反応
田中 健一郎関谷 徹司
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ジャーナル フリー

1996 年 44 巻 2 号 p. 123-132

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Photochemical reactions following core electron excitation on solid surfaces have been subject of intense research. Among such surface reactions, photon stimulated ion desorption (PSID) is a relatively simple and important process to investigate reaction dynamics both theoretically and experimentally.
Recently, we have studied PSID from small molecules on Si(100) surface and from polymer thin films using time-of-flight mass spectrometric techniques and observed sitespecific and state-specific chemical reactions. Experimental results for H2O/Si(100), DCOOD/Si(100) and poly(methyl methacrylate) (PMMA) thin films are discussed in terms of primary excitations followed by the Auger decay and the delocalization of the excitation.

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© 1996 日本質量分析学会
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