Ion-Plating Deposition of MgO Thin Films

Abstract

We developed an advanced ion-plating (AIP) method and deposited MgO thin films for protective layer in plasma display panel (PDP) with it. The preferred orientation of the films was dependent on deposition conditions; oxygen content and substrate temperature. The film was mainly (111) oriented with a small amount of randomly oriented textures. Fine columnar structures grew vertically from the substrate interface with sharp apexes at the film surface. It was supposed that the film structure could be improved a great deal for PDP applications by our AIP.