Preparation of Barium Titanate Film by Metal-Organic Chemical Vapor Deposition and its Thermodynamic Analysis

Abstract

BaTiO₃ films were prepared on fused silica substrates by metal-organic chemical vapor deposition (MOCVD). Effect of deposition conditions on the composition, structure and morphology were studied. Thermodynamic calculations well predicted the relationship between deposition conditions and the phases of deposits. BaTiO₃ films in a single phase were obtained at 973 K and Ba/Ti ratio in the source gas of 0.25 to 0.35. The grain size of BaTiO₃ films increased with decreasing total pressure. BaTiO₃ film in thickness of about 1 \\micron had a relative dielectric constant of 480. The dielectric constant of the BaTiO₃ film showed the maximum value of 530 at 360 K.