Abstract
Surface active agent (surfactant) effect of the adsorbed oxygen atoms on epitaxial growth of fcc ultra thin films (Co, γ-Fe, Cr) on Cu(001), a Co/γ-Fe/Co trilayer on Cu(001) and a [Co/Cu] multilayer was investigated. The surfactant effect of oxygen atoms on the growth of fcc Co on Cu(001)–O reconstructed structure of (2\\sqrt2×\\sqrt2)R45° was found by the RHEED observation. The non-equilibrium fcc structure of Fe was stable until 45 ML on the Cu(001)–O surface formed on Cu(001) single crystal, but 20 ML on the Cu(001)–O surface formed on Cu(001) buffer layer deposited on MgO(001). The surfactant effect was not observed for the non-equilibrium fcc Cr. The surfactant effect of oxygen atoms on the Co/γ-Fe/Co trilayer and [Co/Cu]20 multilayer were observed. The surface reconstruction structure of Cu(001)–O(2\\sqrt2×\\sqrt2)R45° is necessary for the oxygen surfactant effect on the epitaxial growths of fcc metals on Cu(001).
