Partial Sulfurization of Laser-ablated Titanium Oxide Film for the Improvement in Photocatalytic Property

Abstract

Photocatalytic titanium oxide (TiO₂) thin films were prepared on quartz substrate by the pulsed laser deposition using Nd:YAG (λ=1.064 μm) pulse laser. Subsequently, the films were sulfurized in H₂S or CS₂ atmosphere under various conditions. After the sulfurization of the film in H₂S or CS₂ at 1273 K for 1 h, the surface morphology and structure of the deposited TiO₂ film were changed. The photocatalytic property of the film might be improved by the sulfurization using CS₂ at the temperatures lower than 1273 K.