Ar Ion Beam Irradiation Effects on Magnetostrictive Characteristics of Tb-Fe Thin Film

Mitsuaki Takeuchi; Yoshihito Matsumura; Hirohisa Uchida; Toshiro Kuji

doi:10.2320/matertrans.45.225

Mitsuaki Takeuchi, Yoshihito Matsumura, Hirohisa Uchida, Toshiro Kuji

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Keywords: terbium iron alloy, magnetostriction, magnetostrictive susceptibility, thin film, ion beam irradiation, ion implantation, flush evaporation, residual stress, compressive stress, volume magnetostriction

JOURNAL FREE ACCESS

2004 Volume 45 Issue 2 Pages 225-228

DOI https://doi.org/10.2320/matertrans.45.225

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Abstract

TbFe₂ films prepared by a flash evaporation system onto Si(100) or polyimide substrate have been irradiated with different Ar ion doses at zero, 1.3 × 10¹⁷ and 2.7 × 10¹⁷ cm⁻² and at 10 kV. Magnetostrictive properties, i.e., saturated magnetostriction and magnetostrictive susceptibility, of TbFe₂ film with disordered structure were improved by Ar ion beam irradiation. This result was probably caused increasing of in-plane compressive stress corresponding to change of volume magnetostriction.

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