Electron Beam Processed Silica Glass with Multi-Property
2004 年 45 巻 6 号 p. 1903-1906
詳細
2004 年 45 巻 6 号 p. 1903-1906
This paper mainly describes that surface density changes in dangling bond and charging and impurity atom adsorption caused the multiproperties of silica glass irradiated by electron beam (EB). The irradiated silica glass with high wettability, misting free, sterilization, and high strength has been successfully obtained. Dangling bond formation and charging generally attract the poling water molecules. Thus, EB irradiation decreased the water contact angle of silica glass. Scattering of light reflection of fine sessile drops of water usually causes the misting. When the water wettability is caused by EB irradiation, the water thin film is formed. Thus, the electron beam irradiation prevents the misting. On the other hand, the strengthening, generated by EB irradiation, was mainly induced by the stress relaxation induced by dangling bond in network structure of silica glass irradiated.
