MATERIALS TRANSACTIONS
Online ISSN : 1347-5320
Print ISSN : 1345-9678
Preparation Conditions of CaTiO3 Film by Metal-Organic Chemical Vapor Deposition
Mitsutaka SatoRong TuTakashi Goto
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2006 Volume 47 Issue 5 Pages 1386-1390

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Abstract

Calcium titanate (CaTiO3) films were prepared by metal-organic chemical vapor deposition (MOCVD) using Ca(dpm)2 and Ti(O-i-Pr)2(dpm)2 precursors. The phases, composition and morphology of Ca-Ti-O system films changed depending on molar ratio of Ca to Ti (RCa/Ti), total pressure (Ptot) and substrate temperature (Tsub). CaTiO3 films in a single phase were obtained at the condition of RCa/Ti=0.95, Tsub=1073 K and Ptot=0.8 kPa, and RCa/Ti=0.78, Tsub=973 K and Ptot=0.8 kPa. The CaTiO3 films prepared at Tsub=1073 K had a well-developed columnar texture, and significant (010) orientation was observed at RCa/Ti from 0.59 to 0.72. The deposition rate showed the highest value of 1.25×10−8 m s−1 at Tsub=1073 K, Ptot=0.4 kPa and RCa/Ti=0.95.

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© 2006 The Japan Institute of Metals and Materials
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