Preparation of Fullerene Polycrystalline Films on Different Substrates by Physical Vapor Deposition

抄録

Fullerene (C₆₀) films were prepared on Si, ITO, and Cu substrates by the physical vapor deposition (PVD) method. It was observed that the morphology and structure of fullerene films strongly depend on the substrates. Along with the interactions between fullerenes and substrates increasing from ITO, Si to Cu substrate, C₆₀ forms small polycrystalline grains, large polycrystalline grains and fullerene oligomers under the same experimental conditions. The irreversible C₆₀ polymerization on Cu substrate is suggested to be catalyzed by the copper metal.