MATERIALS TRANSACTIONS
Online ISSN : 1347-5320
Print ISSN : 1345-9678
Preparation of N-Doped TiOx Films as Photocatalyst Using Reactive Sputtering with Dry Air
Seon-Hong LeeEiji YamasueHideyuki OkumuraKeiichi N. Ishihara
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2009 Volume 50 Issue 7 Pages 1805-1811

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Abstract

Pale yellow N-doped TiOx films on the glass substrate were prepared by RF magnetron reactive sputtering of Ti target in a mixed gas of argon and dry air. The characteristics of the N-doped TiOx films were studied by SEM, XRD, UV–Vis spectrophotometer and XPS. The photocatalytic ability was evaluated by degradation of NO gas. The air flow ratio has a significant effect on the produced phase and the bonding states of Ti, O and N, resulting in the variation of the optical property and photocatalytic ability. The large amount of N atoms doped and oxygen deficiency are detrimental for photocatalysis, and N bonding states may not be the major contributing factor for the photocatalysis. It is suggested that the coexistence of N2 gas with O2 gas shifts the TiO2 formation boundary towards the low oxygen concentration, which leads to various N (N oxide) doping states on N-doped TiOx film.

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© 2009 The Japan Institute of Metals and Materials
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