Sintered Behaviors and Electrical Properties of Cr50Cu50 Alloy Targets via Vacuum Sintering and HIP Treatments

Abstract

Powder metallurgy is the conventional process for the production of Cr–Cu alloys. Enhanced vacuum sintering techniques and the use of HIP processes can be applied to obtain higher densities and decreased porosity in the sintered parts. In this study, the optimal sintering process of Cr50Cu50 alloy targets is 1270°C for 1 h; a high density and low electrical resistivity of the alloy targets is obtained. The experimental results also indicate that the relative density of the Cr50Cu50 vacuum sintering targets can reach 99.42%, and that apparent porosity decreases to 0.54% after 1050°C at 175 MPa for 4 h of HIP treatments. The crystal property of sintered Cr–Cu alloy is improved, and the resistivity decreased to 589 × 10⁻⁸ Ω·cm; IACS is also enhanced to 29.27% via HIP optimal treatment. This study shows that the high density and optimum properties of sintered Cr50Cu50 alloy targets can be produced by utilizing a suitable HIP treatment.