Effects of Molybdenum Microstructures on Sputtered Films

抄録

The textures of 99.9% purity molybdenum plates in both rolled and recrystallized conditions were investigated by electron backscattering diffraction. The as-rolled molybdenum plates showed a change in texture from {001}⟨110⟩ toward {111}⟨110⟩ with increasing reduction ratio indicating that the texture can be modified through rolling schedule. Both the as-rolled and recrystallized molybdenum plates were made to sputter thin films and to examine the effects of sputtering target microstructures upon sputtered films. The as-rolled sputtering target demonstrated 11% higher sputtering rate than the recrystallized molybdenum target under the same sputtering conditions. Microstructures in the as-rolled plates bear a higher tendency to sputter due to their higher energy. The structures of the sputtering targets demonstrate pronounced effects upon the sputtered films.