2019 Volume 60 Issue 5 Pages 693-697
A thin layer, about 25 nm thick, was produced in glow discharge deposition process on the surface of the NiTi shape memory alloy. Structural and chemical studies revealed that the layer consisted of two sublayers. About 7 nm thick one, adhering closely to the NiTi substrate and formed from the nanocrystalline titanium nitride was followed by 17 nm of the amorphous titanium oxide layer. The technological parameters of the glow discharge process caused that the presence of the R-phase in the matrix was identified.