Microstructure and Preferred Orientation of Titanium Nitride Films Prepared by Laser CVD

Abstract

Titanium nitride (TiN_x: x=0.96–1.12) films were prepared by laser chemical vapor deposition (LCVD) using tetrakis-diethylamide-titanium (TDEAT) and ammonia (NH₃) as source materials. The effects of deposition conditions, mainly total gas pressure (P_tot), laser power (P_L) and pre-heating temperature (T_pre), on the composition, microstructure and preferred orientation of TiN_x films were investigated. The N/Ti ratios (x) in TiN_x films decreased with increasing P_tot and increased with T_pre at P_tot<400 Pa. The preferred orientation significantly depended on the T_pre and P_L. (111) orientation was obtained at T_pre<673 K and P_tot<600 Pa, whereas (200) orientation appeared at T_pre>673 K and P_tot<600 Pa. The increase in P_L caused the change from (200) to (111) orientation. With increasing T_pre, the TiN_x films changed from a faceted texture with (111) orientation to a square texture with (200) orientation.