MATERIALS TRANSACTIONS
Online ISSN : 1347-5320
Print ISSN : 1345-9678
ISSN-L : 1345-9678

This article has now been updated. Please use the final version.

Preparation of Oxygen Permeable Thin Films on YSZ Porous Substrates
Hiroo TakahashiHitoshi TakamuraMasuo Okada
Author information
JOURNAL RESTRICTED ACCESS Advance online publication

Article ID: MBW200726

Details
Abstract
Mixed oxide-ion and electronic conductive thin films with the composition of (Ce0.85Sm0.15)O2−δ-15 vol%MnFe2O4 (CSO-MFO) were prepared on porous yttria stabrized zirconia substrates by a spin coating process, and their oxygen permeation flux densities were measured. The porous substrates were prepared from ZrO2-3 mol%Y2O3 (3YSZ)-33 vol%carbon and NiFe2O4. 3YSZ porous substrates were obtained from 3YSZ-33 vol%carbon by sintering at 1350°C under Ar for 5 h and following oxidation at 800°C under air for 2 h. For 3YSZ-33 vol%NiFe2O4, the optimum condition was sintering at 1400°C under air for 5 h and following reduction at 800°C under H2 for 2 h. A CSO-MFO film was prepared by a spin coating process on the substrate. The thickness of the CSO-MFO was approximately 150 nm. Oxygen flux density of the CSO-MFO sample was found to be 8.9×10−8 mol·cm−2·s−1.
Content from these authors
© 2008 The Japan Institute of Metals and Materials
feedback
Top