Online ISSN : 1347-5320
Print ISSN : 1345-9678
ISSN-L : 1345-9678
Effect of Substrate Temperature, Biasing and Sputter Cleaning on the Structure and Properties of Nanostructured TiB2 Coatings on High Speed Steel
Prasonk SricharoenchaiNurot PanichPatama VisuttipitukulPanyawat Wangyao
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JOURNALS RESTRICTED ACCESS Advance online publication

Article ID: MC200906


Fabrication and development of TiB2-based nanostructured coatings was investigated in the present work. By varying the sputter-target power density, substrate temperature, deposition time, substrate-to-target distance, substrate biasing and substrate sputter cleaning, the relationship between the sputtered structure, properties and sputtering conditions were established. The experimental results showed that the target-to-substrate distance played a major role in the coating structure and properties. Sputter cleaning of substrate helped to improve TiB2 coating hardness and adhesion. The deposition process could be controlled to produce a TiB2 coating with both high hardness and good adhesion strength. This was achieved by introducing substrate sputter-cleaning and then biasing for the early stage of deposition, followed by deposition without biasing.

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