抄録
The purpose of this review is to identify the areas in thermal plasma processing where scientific and/or engineering advances would have been highly expected in the near future, especially, in terms of ceramics technology. To this end, “State-of-the-art” and “Research needs” associated with the area are extensively discussed. In particular, we characterize three types of injection plasma processing (IPP) and review the problems relating to IPP. In order to demonstrate the feasibility and prominent features of IPP, special attention will be given to radio-frequency (rf) and hybrid plasma processing, which will be discussed in conjunction with our recent research concerning the synthesis of ceramic powders and coatings. “Super-high rate deposition of ceramics” and “rf plasma spraying of ceramics” will be proposed as two distinctive candidates for the future development of IPP in the field of ceramic technology.
