特集 「光感応性印刷材料」
カラーフィルタ形成用顔料分散レジスト
1994 年 31 巻 2 号 p. 118-123
詳細
1994 年 31 巻 2 号 p. 118-123
Among technologies for color filter (CF) fabrication, pigment-dispersed color resist (PDCR) photolithography is dominant over all others in commercial manufacture of large, fine-resolution CF for liquid crystal displays. Application of several photochemical transformation systems to PDCR is examined to result in the discovery of a chemical amplification system, based on acid-catalyzed cross-linking, has an advantage of high-resolution. The resolution capability of PDCR is directly related to the resist contrast (γ) the same as the case of resist for semiconductor fabrication. The contribution of a certain pigment on photo -initiated radical reaction is also revealed.
