1994 年 1994 巻 12 号 p. 1134-1136
Silanols are thought to be key intermediates of chemical vapor deposition of silica film from tetraethoxysilane (TEOS). To get information on the formation of silanols from TEOS, compositions of mixtures of gaseous products and surface concentrations of hydroxyl and alkyl groups were traced by GC and FT-IR in isothermal reactions of TEOS on silica gel. It is observed that formation of both ethylene and acetaldehyde from TEOS on silica gel decreases with decreasing amount of surface hydroxyls. It is concluded that the formation of silanols is accelerated by silanols themselves (i. e., autocatalytic for mation of silanols from TEOS).
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