抄録
Applicability of vacuum arc as a source for evaporating metals is investigated. Intermittent discharge type arc with vibrating electrode and continuous discharge type arc are examined at pressures lower than 5×10-4 mm Hg.
With the former type, almost all metals seem able to be used for evaporation; its characteristic is that glossy films of refractory metals such as W, Mo and Pt are easily deposited. Erosion of electrode is always at the cathode causing building up of protrusion on the anode surface. Effect of potential applied to substrate is not so distinctive as in Vodar's experiment; it appears rather contrary to his result. The arcing is typically cathodic, the mechanism of which is also considered.
As to the continuous discharge type, some of its fundamental properties are studied. For metals of low boiling temperature such as Zn, this type of arc is easily maintained which seems however too violent for deposition. For refractory metals, the arc appears difficult to be maintained with current below 80A. Pre-heating of the cathode may remove this difficulty.
