Al斜方向蒸着膜の光学的異方性
1963 年 32 巻 3 号 p. 173-179
詳細
1963 年 32 巻 3 号 p. 173-179
Evaporated aluminium film deposited at oblique incidence of the vapor is known to develop a, coarse surface structure as the thickness or incidence angle increases. The wavelength dependence of regular reflectance, of asymmetry of regular transmittance and of dichroism of the film is, measured with the thickness and vapor incidence angle as parameters, and the structural anisotropy of the film is inferred from the optical anisotropy. The results obtained are as follows:
1. When the r. m. s. surface roughness of the film is sufficiently small in comparison with the wavelength, the roughness can be estimated from the regular reflectance at normal incidence. For example, the r. m. s. roughness of films deposited at 60° incidence and in 35, 40, 55 mμ thickness. is 10, 15 and 20 mμ, respectively.
2. When the vapor incidence angle exceeds 70°, the direction of the growth of crystallites. tends to incline somewhat to the direction of vapor beam.
3. When the vapor incidence angle exceeds 60°, the axial ratio of crystallites oriented in chains. with their long axes perpendicular to the vapor beam becomes above 10 in the evaporation process.
