電子顕微鏡による金薄膜の断面構造

抄録

The structure of the cross section of evaporated thin gold films was investigated electron micrographically by applying the replica technique. Au was used as an evaporating source, and the temperature of the glass substrate was changed from 80°C to 370°C under a constant deposition rate. From observation of the cross section it became evident that, when the temperature of the substrate is higher than about 300°C, the film growth proceeds through coalescence between the islands, however, at a lower temperature the coalescence seems to take place only between the upper strata of the islands. It is also shown that the size of an island, which becomes larger in accordance with the increase of the film thickness, has a maximum limit, above which the island changes its form abruptly into a continuous film.