ECRイオン源によるウランイオン生成

抄録

For production of multi-charged U ion beam for RIKEN Radio isotope beam factory (RIBF) project, we chose two methods (UF₆ and sputtering of metal U). We produced few pμA of medium charge state (14～18+) U ion beam with use of UF₆. For production of higher charge state of U ion beam, we used the sputtering method. Using this method, we produced ～80 pnA of U³⁵⁺ ion beam. These beams were used for commissioning of the accelerator complex of RIKEN RIBF.