Crystallization behavior of amorphous TIO2 films with several noble metals

Futoshi Utsuno; Takeshi Shiroishi; Itaru Yasui

doi:10.14853/pcersj.2002F.0.225.0

15th Fall Meeting of The Ceramic Society of Japan

DOI https://doi.org/10.14853/pcersj.2002F.0.225.0

Conference information

Host: The Ceramic Society of Japan

Crystallization behavior of amorphous TIO2 films with several noble metals

Futoshi Utsuno, Takeshi Shiroishi, Itaru Yasui

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Keywords: Titanium dioxide, sputtering, crystallization, amorphous film, noble metal, photo-catalyst

CONFERENCE PROCEEDINGS FREE ACCESS

Pages 225

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Abstract

TiO₂ films are broadly used as a photocatalyst. Crystal-growth process of amorphous TiO₂ films annealed at 200-1000°C was studied. Amorphous TiO₂ films ware deposited on quartz glass substrates by RF magnetron sputtering. The crystallization of the TiO₂ films deposited on thin layers of some noble metals as nucleation agents was also carried out. Theses films were characterized by TF-XRD, SEM and XPS.

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