抄録
A large area, and transparent film of nanocrystalline diamond was successfully grown on a glass substrate by the microwave plasma CVD method. The deposition was carried out using a CH4/H2 plasma maintaining the substrate temperature at 470 - 500 C. The films are smooth and uniform over an area of 30 × 30 cm2 and exhibit strong adhesion to the glass substrate. UV Raman spectroscopy shows a high quality diamond film by the sharp peak at 1333 cm-1. X-ray diffraction analysis indicates that the film consists of nanocrystalline diamond, i. e., the crystal size is in between 10 to 20 nm. The transmittance for visible light of a film with a thickness of approximately 1μm is 55 % at a wavelength of 500 nm and is greater for higher wavelength, reaching 80 % at 766 nm. This films is applicable to glass windows for use in extreme environments.
