抄録
Various porous alumina nanostructures were fabricated on glass substrates by combining technologies of sputtering deposition and anodization. Highly pure aluminum layers were first sputter-deposited on ITO/glass or Ti/glass substrates and then anodically oxidized in various acid solutions to form porous alumina films with nanopores of Φ 4~400 nm in diameters. Two types of porous nanostructures, ordered-type with parallel channels and branch-type with coral channels, can be achieved by adjusting the fabricating conditions. The anodic alumina films possess highly porous nanostructures with pore density of 5~80 x 1013 pore/m2 and exhibit a high transmittance in 70~95%T (vs. glass) throughout ultraviolet and visible light range. The porous alumina nanostructures can be utilized as templates or carriers to fabricate various integrated or composite nanostructures for versatile applications such as photocatalysis, dye-sensitive photocells, perpendicular magnetic recoding, photonics, etc.
