抄録
Highly transparent Si-O-C-N films were successfully deposited on glass and plastic substrates using direct current arc-discharge ion plating method. The deposition rate, refractive index, and absorbance of the films on glass substrates were evaluated as a function of discharge electron power, total gas pressure, and flow rates of nitrogen and carbon dioxide gas. The visible transmittance of the optimized film was approximately 85%. Moisture and oxygen permeation rates of the films on polyethyleneterephthalate (PET) films were measured by MOCON detection instruments, which were conventional permeation test equipments. The resulting Si-O-C-N films prepared have a possibility of gas barrier film application for organic light emitting diode (OLED) displays.
