Abstract
Selective deposition process of metal oxide thin film was researched for the application to the direct production on chip. In addition, the microstructure, e.g. crystalline degree, of the as-deposited film was also controlled in aqueous solution containing different kinds of precursors. We have succeeded in fabricating patterned alkyl monolayers directly formed on Si for the first time. The patterned alkyl monolayer substrate with both silanol- and methyl regions was used as the template for the selective deposition. This report suggests a reliable approach for fabricating micro-sensor from aqueous solution processing. Additionally, the effects of film thickness and crystallized degree on the electrical and gas sensing properties were investigated.
