Micro-patternning of ferroelectric PZT thin films using the self assembled monolayer

Abstract

This method includes deposition of Self-Assembled Monolayer(SAM) followed by the optical etching by exposing the SAM to the UV-light, leading to the patterned SAM as a selective deposition template. The pattern of SAM was formed by irradiating UV-light to the SAM on substrate through a metal mask for the selective deposition of patterned PZT precursor films from alkoxide precursor sols. As a result, patterned ferroelectric PZT films in micrometer size could be successfully deposited.