Fabrication of transparent micro-imprint silica glass film by extrusion

Abstract

We fabricated transparent silica glass film by sintering a green compact above 1673K and high-vacuum(10-4Pa) atmosphere conditions. Microscale surface modification of silica glass films were. examined by applying conventional stamp mold. The glass green film imprint was proceeded through the simple steps of pressing (~6MPa) at room temperature. The imprinted transparent films were also fabricated by high-vacuum sintering method.