Plasma and Fusion Research
Online ISSN : 1880-6821
ISSN-L : 1880-6821
Letters
Adhesion Strength of TiN Stacked TiO2 Film Correlated with Contact Angle, Critical Load, and XPS Spectra
Shankar PARAJULEEMasahiro HAYAKAWAShunjiro IKEZAWA
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2009 Volume 4 Pages 055

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Abstract
In order to coat TiO2 and TiN/TiO2 films on glass over a large surface area for industrial application, plasma gun and magnetron sputtering processes were used. Also, nitrogen radicals were synthesized on the surface via the atmospheric plasma process. Hydrophilic characteristics were studied via water contact angle. Film adherence was tested via single stylus scratch tester. We also compared the XPS spectra between the nitrogen-synthesized and non-synthesized film and obtained the Ti2p peak shift towards the higher energy level proportional to film adherence. For photocatalytic film durability, the relationship best described, “the higher the critical load, the lower the contact angle, and the higher the binding energy” has become a unique interrelationship among the scratch tester, contact angle, and XPS spectra.
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© 2009 by The Japan Society of Plasma Science and Nuclear Fusion Research
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