レーザー記録用感光性樹脂の研究 (I)

アジド系フォトポリマーの分光増感

抄録

Spectral sensitization of photopolymer with several sensitizers was studied for the argon laser lithography in which 488 nm and 514.5 nm lines were mainly used for exposure. By addition of spectral sensitizers, the range of spectral sensitivity was extended toward longer wavelength. Argon ion laser beem was irradiated in the form of spot on the photosensitive layer coated on silicon wafer or aluminum base. The spot size of the laser beem used was 1.25 mm diameter. The characteristic curve was obtained to plot the spot diameter of cured polymer on the plate against the exposed energy. Among the photopolymer systems studied, the combination of poly [vinyl p-azidobenzoate] and 4-(4'-butoxyphenyl)-2, 6-diphenylthiopyrylium perchlorate showed a very high sensitivity, 1.8 mJ/cm² for the 488 nm laser line. This photopolymer systems followed to the reciprocity law in the light intensity range of 6μJ/cm² sec-80 J/cm² sec. In spot exposure of laser beem, it seemed resonable to evaluate the sensitivity value from the exposure energy to cure the photopolymer to the same size as 1.25 mm.