フォトポリマー最近の進歩
1984 年 47 巻 5 号 p. 313-323
詳細
1984 年 47 巻 5 号 p. 313-323
Recent progress in research and invention of photopolymers are reviewed. Recent main advancements in their research activities are described. Photo-resists, UV-resists, electron beam resists, X-ray resists are reviewed and future view of photopolymers in micro-patterning is discussed.
