4-(ビニルベンジルオキシ) ベンザルアセトフェノン共重合体の合成とオフセットプレートへの応用
1991 年 54 巻 1 号 p. 10-14
詳細
1991 年 54 巻 1 号 p. 10-14
Photopolymers contaning hydrophilic carboxyl groups and photosensitive benzalacetophenone groups are synthesized by condensing the terpolymer comprizing 4-(vinylbenzyloxy) acetophenone, methacrylic acid and 2-HPM (or 2-HEMA, MMA) copolymers with benzaldehyde in alkaline catalyzer. Aqueous alkaline developing solution commercially available for negative type presensitizesd plate can be used for development of these photopolymers.
Sensitivity of the copolymer is estimated to be 35 mJ/cm2 for UV light. These copolymers are applied to lithographic plate (under coat: diazonium polymer 0.2 μm thickness, top coat 4-(VBz) BAp copolymer 1.0-1.2 μm thickness), and the images with high quality are produced by a lithographic proofing machine. The Printing plate of these copolymers shows high resistivity in use of UV ink. These plates can be well preserved at high temperature (70°C) with high moisture condition.
