Towards Surface Growth Lithography Using Polymer Bound Photoactive Acid Generators

Abstract

Surface growth lithography is an attractive technique that eliminates the need for resist transparency. Critical to the success of this method is a smooth and homogeneous film capable of immobilizing a high concentration of initiator on the surface. This report outlines the design, synthesis, and preliminary testing of a polymeric photoactive acid generator (PAG), which is suitable for use with cationic surface growth lithography.