Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
A Development of Photoresist Material for Low Energy Electron Beam Lithography
Satoshi Saito, Tetsuro Nakasugi
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Keywords: line edge roughness, LER, acetal, AFM, EB
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2003 Volume 16 Issue 3 Pages 459-461

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© 2003 The Society of Photopolymer Science and Technology (SPST)
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