Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Advanced RELACS Technology for ArF Resist
Mamoru Terai, Toshiyuki Toyoshima, Takeo Ishibashi, Shinji Tarutani, Kiyohisa Takahashi, Yusuke Takano, Hatsuyuki Tanaka
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Keywords: RELACSTM, Shrink Technology, Photoacid Generator, contact hole pattern, 193 nm lithography
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2003 Volume 16 Issue 4 Pages 507-510

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© 2003 The Society of Photopolymer Science and Technology (SPST)
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