Abstract
Spectroscopic ellipsometry was used to evaluate the surface roughness of dry-etched resists as a simple form of non-destructive analysis. The resist film was analyzed with two kinds of multi-layer models. The dry-etched resist was estimated to have a bulk region and a surface region in which the refractive index decreased closer to the top surface. The 2-layer model was useful in comparing the surfae roughness among various resists. Results of this method are consistent with that of AFM analysis and SEM inspection.
