Pyrromethene Dye Sensitized Photopolymer and the Application to Visible Laser Direct Imaging

Abstract

We investigated a photosensitivity of various initiating systems that consist of sensitizing dyes and initiators. A photopolymer that consists of a pyrromethene sensitizing dye, a naphthalimide type photoacid generator, and a polymer bearing acetal group could exhibit extremely high photosensitivity by applying the chemical amplification mechanism. The sensitization mechanism was also studied by means of absorption and fluorescence spectrum, high performance liquid chromatography, and laser flash photolysis method, and then we applied the novel photopolymer to the Computer-to-Plate technology (CTP) and dry film resist for printed circuit board (PCB).