Abstract
The Photopolymer Science and Technology Award No.42100, the Best Paper Award 2004, was presented to Christopher K. Ober (Cornell University), Katsuji Douki (JSR Micro, Inc.), Young C. Bae (Rohm and Haas Electronic Materials), Junyan Dai (Cornell University) and Will Conley (International SEMATECH) for their outstanding contribution published in Journal of Photopolymer Science and Technology, 16(4), 573-580 (2003), entitled "Strategies for High Transparency Acrylate Resists for 157nm Lithography", ibid., 15(4), 603-612 (2002) entitled "Strategiess for High Resolution Photoresists", and ibid., 14(4), 613-620 (2001),entitled "Rejuvenation of 248 nm Resist Backbones for 157 nm Lithography".
