Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Positive-working Photoimaging Materials Based on Base-amplifying Silicone Resins Having Fluorenyl Groups
Koji Arimitsu, Hiroshi Kobayashi, Takahiro Gunji, Yoshimoto Abe, Kunihiro Ichimura
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Keywords: base proliferation, photobase generator, positive-working photoresist, silicone resin
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2005 Volume 18 Issue 2 Pages 171-172

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© 2005 The Society of Photopolymer Science and Technology (SPST)
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