Highly Sensitive Photocrosslinking System Using Fluorene Derivatives Having Vinyl Ether or Epoxy Moiety

Abstract

Photocrosslinking properties of fluorene-9,9'-bis(4-ethoxyphenyl vinyl ether) (FBPEVE) /fluorene-9,9'-bis(4-phenoxyethyl glycidyl ether) (FBPEG) blend and FBPEVE/poly (glycidyl methacrylate) (PGMA) blend were investigated. Photocrosslinking of FBPEVE/PGMA or FBPEVE/FBPEG blended films containing a photoacid generator (PAG) was observed at lower irradiation dose than that of PGMA, FBPEG, or FBPEVE. The high sensitivity of blended films is due to the enhancement of the conversion of both epoxy and vinyloxy moieties compared with the conversion of simple epoxy in FBPEG or vinyloxy moiety in FBPEVE. The photocrosslinked films showed good thermal stability.