Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Etching Efficiency of Polymethacrylates for Monochromatic Low Energy Ion Beams
Shu Seki, Satoshi Kawachi, Seiichi Tagawa, Akihiko Egami, Kazuaki Kurihara, Moritaka Nakamura, Hiroshi Itoh
Author information
Keywords: polymethacrylate, dry etching, low-k, monochromatic low energy ion beams, etching efficiency
JOURNAL FREE ACCESS

2005 Volume 18 Issue 2 Pages 255-256

Details
Download PDF (177K)
Download citation RIS

(compatible with EndNote, Reference Manager, ProCite, RefWorks)

BIB TEX

(compatible with BibDesk, LaTeX)

Text
How to download citation
Contact us
Article 1st page
Content from these authors
© 2005 The Society of Photopolymer Science and Technology (SPST)
Previous article Next article
Favorites & Alerts

Recently viewed articles
Share this page
feedback
 Top