Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Low Temperature Curing of Polyimide Precursors by Variable Frequency Microwave
Hiroshi MatsutaniTakashi HattoriMasayuki OheTakumi UenoRobert L. HubbardZak Fathi
Author information
JOURNAL FREE ACCESS

2005 Volume 18 Issue 2 Pages 327-332

Details
Abstract

Polyimides are commonly used as a thermally stable insulator for semiconductors. To assure adequate chemical or physical properties, a layer of their precursors has to be cured in a convection oven at more than 300 °C. In this paper, we compare variable frequency microwave (VFM) heating with convection heating for curing various polyimide precursors and a photosensitive polyimide precursor. Then, we demonstrate that the use of VFM enables us to cure the precursor lower than the standard convection cure temperature while maintaining necessary film properties such as cyclization, Tg, Td, and elongation.

Content from these authors
© 2005 The Society of Photopolymer Science and Technology (SPST)
Previous article Next article
feedback
Top