2005 Volume 18 Issue 4 Pages 551-558
Polymer material is one of the key technologies in nanoimprint lithography. The process conditions are strongly depends on the characteristics of the polymer. To optimize and design polymer characteristics for nanoimprint lithography, understanding process mechanism is indispensable. This paper reviews typical polymer characteristics and deformation process in thermal nanoimprint process by theoretical analysis. Also, UV curing process is investigated by simulation analysis and some issues are studied. Based on these results, polymer science for nanoimprint process is discussed.
