Dissolution Enhancement of Immersion Barrier Coat by Post Exposure Bake

Abstract

Immersion barrier coat was formulated and evaluated on ArF photoresists from view points of profiles and lithographic performances with both dry and wet conditions. Hydrophobic group, acid group, and polar group were introduced into base polymer to realize water-barrier property and developability. In order to compensate the in sufficient developability, an additive is included in the formulation that can enhance the developability.