Refractive Index Change and Color Imaging of Acid-Chromic Polymer Films Using EB-Induced Acid Generation

Jun Kato; Kanako Yuasa; Harumi Matsushita; Yasunari Maekawa; Kazuyuki Enomoto; Tatsuhito Ishii; Kazuo Itoh; Takashi Yamashita

doi:10.2494/photopolymer.19.105

Jun Kato, Kanako Yuasa, Harumi Matsushita, Yasunari Maekawa, Kazuyuki Enomoto, Tatsuhito Ishii, Kazuo Itoh, Takashi Yamashita

Author information

Jun Kato
Department of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science
Kanako Yuasa
Department of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science
Conducting Polymer Materials Group, Quantum Beam Science Directorate, Japan Atomic Energy Agency
Harumi Matsushita
Department of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science
Yasunari Maekawa
Conducting Polymer Materials Group, Quantum Beam Science Directorate, Japan Atomic Energy Agency
Kazuyuki Enomoto
Conducting Polymer Materials Group, Quantum Beam Science Directorate, Japan Atomic Energy Agency
Tatsuhito Ishii
Department of Electronic Engineering, Faculty of Engineering, Gunma University
Kazuo Itoh
Department of Electronic Engineering, Faculty of Engineering, Gunma University
Takashi Yamashita
Department of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science

Keywords: electron beam, acid-chromic polymer, EB-acid generator, refractive index, nanoscale color imaging

JOURNAL FREE ACCESS

2006 Volume 19 Issue 1 Pages 105-110

DOI https://doi.org/10.2494/photopolymer.19.105

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Abstract

The novel electron beam (EB)-induced color imaging system, consisting of polymer films with acid-responsive chromic molecules (chromic dyes) and EB-acid generators (EBAGs) was proposed. EB irradiation of the acid-chromic polymer films induced acid generation from EBAG, resulting in color formation of the acid-chromic molecules (protonated forms). Nanoscale color imaging on the acid- chromic polymer films was carried out using EB scanning direct drawing. Clear color imaging of 200 nm square and 100 nm line/space patterns could be observed with a dose of only 50 μC cm^-2. Furthermore, the large EB-induced refractive index change of these films (∼0.013 at 632.8 nm) was observed in both TE and TM modes by an m-line method, which is sufficient to create an optical circuit.

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