Journal of Photopolymer Science and Technology
Online ISSN : 1349-6336
Print ISSN : 0914-9244
ISSN-L : 0914-9244
Positive-type Photo-patterning of Low-CTE, High-modulus Transparent Polyimide Systems
Masatoshi HasegawaYuma TanakaKazunori KosekiAzumi Tominaga
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2006 年 19 巻 2 号 p. 285-290

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Recently we developed novel poly(ester imide)s (PEsI) possessing a low CTE, a high modulus, a high Tg, high toughness, and a low water absorption at the same time. The present work describes that these PEsI precursors (PEsAA) dispersing diazonaphthoquinone (DNQ) as a photosensitizer gave a good positive-tone fine pattern by development using a 1.0 or 2.38 wt % TMAH aqueous solution. A PEsAA film containing 30 wt % DNQ showed no sufficient difference of the dissolution rates between the exposed/unexposed areas. Then, an imide-containing fluorinated diamine monomer was synthesized and introduced into the PEsAA main chains by copolymerization to control the solubility of the PEsAA in TMAH. The use of PEsAAs possessing an imide content of 15?20 % enabled us to form fine patterns. The thermally cured PEsI film maintained a low CTE, a high modulus, and low water absorption. The introduction of imide-containing fluorinated diamine increased the transmittance at 365 nm and decreased the dielectric constant and water absorption. On the other hand, the use of fluorinated rigid diamine, TFMB made possible to obtain fine pattern without imide-containing diamine in addition to excellent combined properties of the PEsI film.

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© 2006 The Society of Photopolymer Science and Technology (SPST)
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